Search research articles

ABOUT JoVE

Overview Leadership Blog JoVE Help Center

AUTHORS

Publishing Process Editorial Board Scope & Policies Peer Review FAQ Submit

LIBRARIANS

Testimonials Subscriptions Access Resources Library Advisory Board FAQ

RESEARCH

JoVE Journal Methods Collections JoVE Encyclopedia of Experiments Archive

EDUCATION

JoVE Core JoVE Business JoVE Science Education JoVE Lab Manual Faculty Resource Center Faculty Site

Terms & Conditions of Use

Related Concept Videos

Linear Approximation in Time Domain

Linear Approximation in Time Domain

Nonlinear systems often require sophisticated approaches for accurate modeling and analysis, with state-space representation being particularly effective. This method is especially useful for systems where variables and parameters vary with time or operating conditions, such as in a simple pendulum or a translational mechanical system with nonlinear springs.
For a simple pendulum with a mass evenly distributed along its length and the center of mass located at half the pendulum's length,...

Linear Approximation in Frequency Domain

Linear Approximation in Frequency Domain

Linear systems are characterized by two main properties: superposition and homogeneity. Superposition allows the response to multiple inputs to be the sum of the responses to each individual input. Homogeneity ensures that scaling an input by a scalar results in the response being scaled by the same scalar.
In contrast, nonlinear systems do not inherently possess these properties. However, for small deviations around an operating point, a nonlinear system can often be approximated as linear....

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by

Same author

Homoharringtonine, aclarubicin and cytarabine (HAA) regimen as the first course of induction therapy is highly effective for acute myeloid leukemia with t (8;21).

Leukemia research·2016

Same author

[Morphology and Spectral Properties Study of LaCeF3:Tb Microcrystalline].

Guang pu xue yu guang pu fen xi = Guang pu·2016

Same author

A highly selective fluorogenic probe for the detection and in vivo imaging of Cu/Zn superoxide dismutase.

Chemical communications (Cambridge, England)·2016

Same author

Development of a disaggregation-induced emission probe for the detection of RecA inteins from Mycobacterium tuberculosis.

Chemical communications (Cambridge, England)·2016

Same author

Bias-polarity-dependent resistance switching in W/SiO2/Pt and W/SiO2/Si/Pt structures.

Scientific reports·2016

Same author

Sequential Anaerobic/Aerobic Digestion for Enhanced Carbon/Nitrogen Removal and Cake Odor Reduction.

Water environment research : a research publication of the Water Environment Federation·2016

Same journal

Long-term stabilization of intensity-difference squeezing from four-wave mixing in rubidium vapor.

Optics express·2026

Same journal

Robust 3D topography measurement of large-range high-aspect-ratio structures based on dual-domain statistical filtering in SD-OCT.

Optics express·2026

Same journal

Broadband transmissive terahertz metasurface for simultaneous quad-mode OAM multiplexing.

Optics express·2026

Same journal

Leveraging two-dimensional materials for high-sensitivity optical sensors: quasi-bound states in the continuum within hybrid metasurfaces.

Optics express·2026

Same journal

Resolution investigation for dual-spherical-wave optical scanning holographic microscopy: methods and performance.

Optics express·2026

Same journal

Robustness of parallel subnetwork-filtered diffractive deep neural networks.

Optics express·2026

See all related articles

Search research articles

Related Experiment Video

Updated: Jul 1, 2025

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

Published on: January 25, 2021

Linearized EUV mask optimization based on the adjoint method.

Pinxuan He, Jiamin Liu, Honggang Gu

|March 5, 2024

Summary

This summary is machine-generated.

This study introduces a fast EUV mask optimization method using the adjoint method to address thick mask effects in semiconductor manufacturing. The linearized gradient significantly improves efficiency for advanced production nodes.

More Related Videos

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

Published on: January 27, 2017

Related Experiment Videos

Last Updated: Jul 1, 2025

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

Published on: January 25, 2021

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

Published on: January 27, 2017

Area of Science:

Photolithography
Semiconductor Manufacturing
Computational Lithography

Background:

Mask optimization is crucial for advanced EUV lithography, but faces challenges due to high computational costs and the thick mask effect.
Existing methods struggle to efficiently optimize EUV masks while rigorously accounting for the thick mask effect and optical proximity effect.

Purpose of the Study:

To propose a linearized EUV mask optimization method using the adjoint method for fast and effective optimizations.
To address the computational challenges and improve the accuracy of EUV mask optimization under rigorous thick mask effect considerations.

Main Methods:

Introduced the adjoint method to calculate the gradient of the EUV mask model.
Developed a linearized gradient to efficiently compensate for wafer pattern distortion caused by the thick mask effect.
Implemented a two-step strategy for EUV mask optimization.

Main Results:

The adjoint method enables gradient calculation for EUV mask models.
The linearized gradient demonstrated an approximate 40% efficiency improvement in the coarse optimization step.
The proposed method showed promise for accurate full-chip EUV mask optimization.

Conclusions:

The linearized EUV mask optimization method based on the adjoint method offers a fast and effective solution.
This approach successfully mitigates challenges associated with the thick mask effect in EUV lithography.
The method is a promising advancement for accurate full-chip EUV mask optimization in semiconductor production.