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In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
Direct visualization and 3D reconstruction of conductive filaments in aSiO2 material-based memristive device
Stanislav Slang1, Bin Gu2, Bo Zhang2
1Center of Materials and Nanotechnologies, Faculty of Chemical Technology, University of Pardubice, nam. Cs. Legii 565, Pardubice 530 02, Czech Republic.
Researchers visualized conductive filaments in memristive devices using focused ion beam (FIB) milling. Joule heating causes filament vaporization and defects, leading to current fluctuations and enabling failure analysis.
Area of Science:
- Materials Science
- Solid-State Physics
- Nanotechnology
Background:
- Conductive filaments are crucial for understanding memristive device operation.
- Previous theoretical models lacked direct visualization of filament morphology.
Purpose of the Study:
- To visualize and reconstruct conductive filaments in a Cu/Cu-doped SiO2/W memristive device.
- To investigate the role of Joule heating in filament evolution and defect formation.
- To develop a methodology for 3D reconstruction of filaments for failure analysis.
Main Methods:
- Focused Ion Beam (FIB) milling in top-down and front-back modes.
- Scanning Electron Microscopy (SEM) imaging of the device after DC sweep cycles.
- 3D reconstruction of conductive filaments and defects from FIB-SEM images.
Main Results:
- Joule heat significantly influences conductive filament morphology, causing vaporization and creating defects like particles, voids, and cavities.
- The interplay between filament formation and vaporization leads to substantial current fluctuations.
- Exfoliation of adjacent single layers by vaporized material was observed.
Conclusions:
- The study provides a detailed 3D visualization of conductive filaments and associated defects in memristive devices.
- Joule heating is identified as a key factor in memristor degradation and current instability.
- The developed FIB-based methodology offers a promising approach for future memristive device failure analysis.
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