Related Experiment Video
Updated: Jun 29, 2025

Non-equilibrium Microwave Plasma for Efficient High Temperature Chemistry
Published on: August 1, 2017
CH3 Radical Generation in Microplasmas for Up-Conversion of Methane
Mackenzie Meyer1, Sanjana Kerketta1, Ryan Hartman2
1Electrical Engineering and Computer Science Department, University of Michigan, 1301 Beal Avenue, Ann Arbor, Michigan 48109-2122 ,United States.
This study explores converting methane into valuable chemicals using microplasma technology. Optimized conditions in microfluidic chips enhance methyl radical (CH3) production and capture for efficient aqueous processing.
Area of Science:
- Plasma Chemistry and Engineering
- Chemical Reaction Engineering
- Microfluidics and Nanotechnology
Background:
- Converting methane (CH4) to higher-value chemicals via low-temperature plasmas faces challenges in efficiency and selectivity.
- Capturing plasma-generated methyl radicals (CH3) in a solvent is a promising route for aqueous processing.
- The rapid reactivity of CH3 necessitates short transport distances from production to solvation, favoring microplasma systems.
Purpose of the Study:
- To computationally investigate the generation of methyl radicals (CH3) in Ar/CH4/H2O plasmas within dielectric barrier discharge microplasmas.
- To analyze the influence of gas mixture composition and electrical parameters on CH3 production.
- To examine the impact of microchannel design and solvent flow arrangement on CH3 density and fluence to the solvent.
Main Methods:
- Computational investigation of nanosecond pulsed dielectric barrier discharge microplasmas in a microfluidic chip.
- Simulation of Ar/CH4/H2O plasma sustained in channels with wall-flowing or droplet-based solvent.
- Parametric variation of gas mixture (CH4 percentage), electrical properties (permittivity, energy deposition, pulse length), and microchannel design.
Main Results:
- CH3 is primarily formed via electron-impact dissociation and dissociative excitation transfer of CH4, and reaction of CH2 with CH4.
- CH3 is rapidly consumed to form C2H6, C3H8, and CH3OH, which accumulate as stable products.
- Optimal CH3 production occurs at 5% CH4 due to a balance between dissociation and radical reactions; increased dielectric permittivity and energy deposition enhance CH3 yield.
Conclusions:
- Microplasma reactors offer a viable platform for generating and capturing CH3 radicals for subsequent aqueous processing.
- Solvent immersion as droplets or a wall layer where ionization waves terminate maximizes CH3 fluence.
- High densities of solvated CH3 (CH3aq) are achieved with numerous droplets, but rapid desolvation necessitates swift downstream reactions.
Related Concept Videos
Radical Substitution: Halogenation of Alkanes and Alkyl Substituents
In the initiation step of the reaction, the chlorine molecule undergoes homolytic cleavage in the presence of light or heat, forming two highly reactive chlorine radicals. Propagation occurs in two...
Radicals: Electronic Structure and Geometry
Accordingly, the structure of a trivalent radical lies between the geometries of carbocations and carbanions. An sp2-hybridized carbocation is trigonal planar, while an sp3-hybridized carbanion is trigonal pyramidal. Here, the difference in geometry is...
Radical Substitution: Allylic Chlorination
Radical Anti-Markovnikov Addition to Alkenes: Thermodynamics
Radical Anti-Markovnikov Addition to Alkenes: Overview
Radical Substitution: Hydrogenolysis of Alkyl Halides with Tributyltin Hydride
The bonds formed in this reaction are stronger than the bonds broken, making it energetically favorable. The reaction follows a radical chain mechanism similar to radical halogenation...

