Pure ZrO2 Ferroelectric Thin Film for Nonvolatile Memory and Neural Network Computing

Zijian Wang1, Zeyu Guan1, He Wang1

  • 1Hefei National Research Center for Physical Sciences at the Microscale, Department of Physics and CAS Key Laboratory of Strongly-Coupled Quantum Matter Physics, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China.

Summary

Ferroelectric hafnium oxide (ZrO2) thin films show promise for nonvolatile memory and artificial neural networks. Devices exhibit excellent polarization, low leakage, and enable high accuracy in image recognition simulations.