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High-Resolution Electron Ionization Mass Spectrometry of Stannane: Deconvolution of Superimposed Fragmentation
Joshua Rieger1, Thorsten Benter1, Hendrik Kersten1
1Department of Physical and Theoretical Chemistry, University of Wuppertal, Gaussstr. 20, 42119 Wuppertal, Germany.
Journal of the American Society for Mass Spectrometry
|June 12, 2024
Summary
This study presents a high-resolution mass spectrum of stannane, crucial for understanding tin removal in extreme ultraviolet lithography. The spectrum aids in analyzing stannane formation and decomposition mechanisms.
Area of Science:
- Plasma Physics
- Surface Chemistry
- Analytical Chemistry
Background:
- Extreme ultraviolet (EUV) lithography utilizes pulsed laser plasmas, leading to tin droplet evaporation and deposition.
- Surface-bound tin removal often involves hydrogen plasma, forming stannane (SnH4).
- The precise mechanisms of stannane formation and decomposition are not fully understood.
Purpose of the Study:
- To provide a high-resolution, isotopically characterized mass spectrum of stannane for analytical reference.
- To elucidate the mechanisms of stannane formation and decomposition.
- To investigate the influence of ion source parameters on fragment formation.
Main Methods:
- Acquisition of a high-resolution 70 eV electron ionization (EI) mass spectrum of stannane.
- Inclusion of all ten natural tin isotopes in the fragment analysis.
- Utilizing the RASP program to calculate fragment distributions from isotopically superimposed mass signals.
- Determination of fragment formation dependence on ion source pressure and temperature.
Main Results:
- A comprehensive, high-resolution EI mass spectrum of stannane, including isotopic distributions, was generated.
- The RASP program successfully calculated relative fragment distributions.
- Dependencies of fragment formation on ion source pressure and temperature were quantified.
Conclusions:
- The presented stannane mass spectrum serves as a vital reference for mass spectrometric analysis.
- This work provides crucial data for understanding tin removal processes in EUV lithography.
- The study offers insights into the fundamental mechanisms governing stannane behavior under EI conditions.
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