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Updated: Jun 24, 2025

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A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
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Abridging the CMOS Technology II
1Department of Electrical Engineering, City University of Hong Kong, Hong Kong, China.
Nanomaterials (Basel, Switzerland)
|June 13, 2024
Abstract:
As silicon CMOS devices approach their physical and technological miniaturization limits, Moore's Law is expected to persist for several more cycles, thanks to innovative, more compact layout structures [...].
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