Sequential Infiltration Synthesis of Al₂O₃ in PMMA Thin Films: Temperature Investigation by Operando Spectroscopic...

Area of Science:

• Materials Science
• Chemical Engineering
• Nanotechnology

Background:

• Sequential infiltration synthesis (SIS) is a scalable method for creating organic-inorganic hybrid materials.
• Fundamental physicochemical phenomena governing SIS processes require further elucidation for industrial applications.

Purpose of the Study:

• To investigate the infiltration of Al2O3 into poly(methyl methacrylate) (PMMA) films using trimethyl aluminum (TMA) and H2O.
• To determine the diffusion coefficient and activation energy of TMA in PMMA.
• To obtain data on the reactivity of TMA with the PMMA matrix.

Main Methods:

• Operando dynamic spectroscopic ellipsometry (SE) was employed to monitor the SIS process in real-time.
• Trimethyl aluminum (TMA) and H2O were used as precursors for Al2O3 infiltration.
• Experiments were conducted at temperatures ranging from 70 to 100 °C.

Main Results:

• The diffusion coefficient of TMA in PMMA was determined at various temperatures.
• The activation energy for TMA diffusion in PMMA was calculated as E_a = 2.51 ± 0.03 eV.
• Temperature-dependent reactivity data of TMA with the PMMA matrix were systematically collected.

Conclusions:

• The study provides crucial insights into the fundamental mechanisms of SIS.
• The obtained data will aid in developing comprehensive theoretical models for SIS processes.
• This research facilitates the optimization of SIS for industrial-scale material synthesis.