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Published on: October 23, 2018
Microstructure Evolution and Electrical Behaviors for High-Performance Cu2O/Zr-Doped β-Ga2O3 Heterojunction Diodes
Jiangyiming Jiang1, Simeng Wu1, Peisen Liu1
1Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials, Ministry of Education and School of Materials Science and Engineering, Shandong University, Jinan 250061, P. R. China.
Zr doping enhances low-temperature fabrication of beta-gallium oxide (β-Ga2O3) films. This improves crystallinity for high-quality cuprous oxide/β-Ga2O3 heterojunction diodes, crucial for advanced electronics.
Area of Science:
- Materials Science
- Semiconductor Physics
- Device Engineering
Background:
- Beta-gallium oxide (β-Ga2O3) is an ultrawide band gap semiconductor critical for high-power, high-frequency, and deep-UV optoelectronics.
- Low-temperature fabrication of β-Ga2O3 films is desired for flexible electronics but often results in poor crystallinity and defects, limiting device performance.
- High-quality heterojunction interfaces are essential for advanced semiconductor devices.
Purpose of the Study:
- To investigate the effect of Zirconium (Zr) doping on the crystallinity and microstructure of β-Ga2O3 films deposited at low temperatures.
- To fabricate and characterize cuprous oxide (Cu2O)/Zr-doped β-Ga2O3 heterojunction diodes.
- To evaluate the electrical performance and interface quality of the fabricated heterojunction diodes.
Main Methods:
- Fabrication of Cu2O/Zr-doped β-Ga2O3 heterojunction diodes using magnetron sputtering without intentional substrate heating.
- Microstructural analysis to assess film crystallinity and phase purity.
- Electrical characterization including current-voltage (J-V) and capacitance-voltage (C-V) measurements.
Main Results:
- Zr doping significantly improved the crystallinity of β-Ga2O3 films at low substrate temperatures, transitioning from amorphous to crystalline β phase.
- Crystalline β-Ga2O3 promoted epitaxial growth of Cu2O and suppressed the formation of the detrimental CuO secondary phase at the interface.
- The Cu2O/Zr-doped β-Ga2O3 heterojunction diodes exhibited near-ideal electrical behavior with a low ideality factor of 1.6.
Conclusions:
- Zr doping is an effective strategy to achieve high-quality β-Ga2O3 films and heterojunction interfaces at low deposition temperatures.
- The developed fabrication method enables low-temperature production of high-performance β-Ga2O3-based heterojunction devices.
- This approach holds promise for applications in flexible electronics and other advanced electronic and optoelectronic devices.
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