Computational optical sectioning via near-field multi-slice ptychography

We introduce a method for the computational sectioning of optically thick samples based on a combination of near-field and multi-slice ptychography. The method enables a large field-of-view 3D phase imaging of samples that is an order of magnitude thicker than the depth of field of bright-field microscopy. An axial resolution for these thick samples is maintained in the presence of multiple scattering, revealing a complex structure beyond the depth of the field limit. In this Letter, we describe the new, to the best of our knowledge, approach and demonstrate its effectiveness using a range of samples with diverse thicknesses and optical properties.