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Mechanical Properties of Silicon Nitride in Different Morphologies: In Situ Experimental Analysis of Bulk and Whisker
Bokang Wang1, Tanglong Bai1, Weide Wang2
1Shanghai Key Laboratory of High-Resolution Electron Microscopy, School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China.
Abstract:
Silicon nitride (Si3N4) is widely used in structural ceramics and advanced manufacturing due to its excellent mechanical properties and high-temperature stability. These applications always involve deformation under mechanical loads, necessitating a thorough understanding of their mechanical behavior and performance under load. However, the mechanical properties of Si3N4, particularly at the micro- and nanoscale, are not well understood. This study systematically investigated the mechanical properties of bulk Si3N4 and Si3N4 whiskers using in situ SEM indentation and uniaxial tensile strategies. First, nanoindentation tests on bulk Si3N4 at different contact depths ranging from 125 to 450 nm showed significant indentation size effect on modulus and hardness, presumably attributed to the strain gradient plasticity theory. Subsequently, in situ uniaxial tensile tests were performed on Si3N4 whiskers synthesized with two different sintering aids, MgSiN2 and Y2O3. The results indicated that whiskers sintered with Y2O3 exhibited higher modulus and strength compared to those sintered with MgSiN2. This work provides a deeper understanding of the mechanical behavior of Si3N4 at the micro- and nanoscale and offers guidance for the design of high-performance Si3N4 ceramic whiskers.
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