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Transport in a Two-Channel Nanotransistor Device with Lateral Resonant Tunneling
Ulrich Wulf1, Amanda Teodora Preda2,3, George Alexandru Nemnes2,3
1Faculty 1, Brandenburg University of Technology Cottbus-Senftenberg, Platz der Deutschen Einheit 1, Konrad-Wachsmann-Allee 13, 03046 Cottbus, Germany.
Abstract:
We study field effect nanotransistor devices in the Si/SiO2 material system which are based on lateral resonant tunneling between two parallel conduction channels. After introducing a simple piecewise linear potential model, we calculate the quantum transport properties in the R-matrix approach. In the transfer characteristics, we find a narrow resonant tunneling peak around zero control voltage. Such a narrow resonant tunneling peak allows one to switch the drain current with small control voltages, thus opening the way to low-energy applications. In contrast to similar double electron layer tunneling transistors that have been studied previously in III-V material systems with much larger channel lengths, the resonant tunneling peak in the drain current is found to persist at room temperature. We employ the R-matrix method in an effective approximation for planar systems and compare the analytical results with full numerical calculations. This provides a basic understanding of the inner processes pertaining to lateral tunneling transport.
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