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Atomic Absorption Spectroscopy: Instrumentation

Atomic Absorption Spectroscopy: Instrumentation

An atomic absorption spectrophotometer (AAS) comprises several components: a radiation source, an atomizer, a monochromator, and a detector. The radiation source can be a hollow-cathode lamp (HCL) or an electrodeless-discharge lamp (EDL), both of which provide a narrow emission line of the required wavelength. However, some instruments use continuum sources and high-resolution monochromators to achieve a narrow range of radiation.
The atomizer used in AAS can be either a flame atomizer or an...

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Updated: May 6, 2026

Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films

Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films

Published on: December 4, 2014

An automatic multi-precursor flow-type atomic layer deposition system.

Daniel J Rodriguez¹, Mai A Her², Igor O Usov¹

¹Engineered Materials Group (MST-7), Los Alamos National Laboratory, P.O. Box 1663, Los Alamos, New Mexico 87545, USA.

The Review of Scientific Instruments

|November 18, 2024

Summary

This summary is machine-generated.

Two automated atomic layer deposition (ALD) reactors were developed for coating additively manufactured metal parts. The systems successfully deposited alumina films on stainless steel, demonstrating precise atomic layer control for advanced material applications.

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Area of Science:

Materials Science
Chemical Engineering
Nanotechnology

Background:

Additively manufactured (AM) metal parts require advanced surface coatings for enhanced properties.
Atomic Layer Deposition (ALD) offers precise control over thin film deposition, crucial for complex geometries.

Purpose of the Study:

To design and present two automated ALD flow reactors for coating AM metal prints.
To demonstrate the capability of these reactors for uniform thin film deposition.

Main Methods:

Development of two distinct ALD reactor designs: one for batch processing and one for single part experiments.
Utilized custom LabVIEW software for automated control and in situ monitoring of temperature, pressure, and film thickness via quartz crystal microbalance.
Deposited alumina (Al2O3) films on AM 316L stainless steel using trimethylaluminum (TMA) and water (H2O) precursors with nitrogen (N2) purge gas.

Main Results:

Achieved a film thickness of approximately 55 nm after 150 ALD cycles of Al2O3.
Verified atomic layer-level deposition accuracy using Rutherford backscattering spectroscopy.
Demonstrated consistent and conformal coating on additively manufactured stainless steel substrates.

Conclusions:

The developed automated ALD reactors are capable of precise thin film deposition on AM metal parts.
The systems enable reliable, in situ monitored coating processes with atomic layer control.
These reactors provide a valuable tool for enhancing the surface properties of additively manufactured components.