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Multi-segment cooling design of a reflection mirror based on the finite-element method.

Zhen Wang1, Yajun Tong1, Fang Liu1

  • 1Center for Transformative Science, ShanghaiTech University, 393 Middle Huaxia Road, Shanghai 201210, People's Republic of China.

Journal of Synchrotron Radiation
|November 18, 2024
PubMed
Summary

Optimizing cooling for mirrors in high-repetition-rate X-ray Free Electron Lasers (XFELs) significantly reduces thermal deformation. This enhances beam quality and ensures stable operation for facilities like Shanghai HIgh-repetition-rate XFEL aNd Extreme light facility (SHINE).

Keywords:
cooling optimizationfinite-element analysisheight errorhigh heat load

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Area of Science:

  • Optics and Photonics
  • X-ray Free Electron Lasers (XFELs)
  • Thermal Management

Background:

  • High-repetition-rate XFELs require optics with minimal thermal deformation to preserve wavefront quality.
  • The Shanghai HIgh-repetition-rate XFEL aNd Extreme light facility (SHINE) faces challenges due to high average thermal power impacting optical components.

Purpose of the Study:

  • To optimize the thermal management of first reflection mirrors (M1) in the SHINE beamline.
  • To minimize thermal deformation and its impact on beam quality and facility operation.

Main Methods:

  • Numerical calculations were employed to optimize the cooling length and position of cooling grooves on the M1 mirrors.
  • Analysis focused on reducing the root mean square (RMS) height error caused by thermal deformation.

Main Results:

  • Optimized cooling reduced the RMS height error of thermal deformation at 900 eV by 12.7× (from 13.76 nm to 1.08 nm).
  • The design eliminated stray light in the sample's focus spot, increasing peak intensity by 177% (from 3.08 × 10^5 to 8.53 × 10^5).
  • A multi-segment cooling design improved focus spot quality and ensured stable SHINE operation.

Conclusions:

  • The optimized cooling design effectively mitigates thermal deformation in XFEL mirrors.
  • Improved thermal management is crucial for maintaining beam quality and enabling stable high-repetition-rate operation of XFEL facilities.
  • This approach advances the performance of XFEL beamlines, ensuring reliable scientific output.