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Thermal Characterization of Ferroelectric Al1-BN for Nonvolatile Memory
Kyuhwe Kang1, Joseph A Casamento2, Daniel C Shoemaker1
1Department of Mechanical Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States.
Boron-substituted aluminum nitride (Al1-BN) shows promise for ferroelectric memory (FeRAM) due to its thermal stability. However, its low thermal conductivity can cause significant self-heating during operation, potentially limiting device performance.
Area of Science:
- Materials Science
- Solid State Physics
- Electrical Engineering
Background:
- Boron (B)-substituted wurtzite aluminum nitride (Al1-BN) is a novel ferroelectric material with potential for advanced memory applications.
- Compared to traditional ferroelectrics like Hf1-ZrO2 and PbZr1-TiO3, Al1-BN offers lower growth temperatures and stable polarization.
- Wurtzite ferroelectrics may exhibit increased self-heating due to higher coercive fields and remanent polarization, posing challenges for device reliability.
Purpose of the Study:
- To investigate the self-heating effects in ferroelectric nonvolatile random-access memory (FeRAM) devices based on Al1-BN.
- To understand the impact of boron composition on the thermal conductivity of Al1-BN thin films.
- To analyze the transient thermal response and temperature rise in Al1-BN based FeRAM under operational conditions.
Main Methods:
- Experimental measurement of thermal conductivity in Al1-BN thin films with varying boron compositions (x).
- Micro-Raman thermometry to investigate the transient thermal response of an Al0.93B0.07N metal-ferroelectric-metal (MFM) capacitor.
- Device thermal modeling and simulation to validate experimental findings and predict performance under GHz frequency switching.
Main Results:
- Thermal conductivity of Al1-BN thin films decreases significantly with increasing boron content, dropping from 40.9 W m-1 K-1 to 4.35 W m-1 K-1 as B composition (x) increases from 0 to 0.18.
- Experimental and simulation results indicate a potential temperature rise exceeding 150 °C in a 5 nm Al1-BN FeRAM device operating at GHz frequencies.
- Thermal crosstalk in FeRAM arrays further exacerbates self-heating, leading to a predicted steady-state temperature rise an order of magnitude higher than in single cells.
Conclusions:
- The substantial reduction in thermal conductivity of Al1-BN with increasing boron content is a critical factor for self-heating in FeRAM.
- High operating frequencies and thermal crosstalk in Al1-BN based FeRAM can lead to significant temperature increases, potentially impacting device reliability and performance.
- Further research is needed to mitigate self-heating effects for the practical implementation of Al1-BN in high-density, high-speed FeRAM.
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