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Aberration calculation of microlens array using differential algebraic method.

Jintao Hu1, Lei Yue1, Yihao Ma1

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Summary
This summary is machine-generated.

This study introduces a new method using differential algebra to calculate high-order aberrations in microlens arrays (MLAs). The approach accurately models complex electric fields for improved electron-beam system performance.

Keywords:
Differential algebraic methodHigh-order aberrationsMicrolens arrayMultipole field effects

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Area of Science:

  • Optics and Photonics
  • Charged Particle Optics
  • Computational Physics

Background:

  • Microlens arrays (MLAs) are crucial components in multi-electron-beam systems for focusing sub-beams.
  • Accurate calculation of aberrations is essential for optimizing system performance.
  • Existing methods may not fully account for complex field interactions within MLAs.

Purpose of the Study:

  • To develop a novel approach for calculating high-order aberrations in both axial and off-axial microlenses within an MLA.
  • To incorporate the influence of multipole fields from neighboring structures and rotationally symmetric fields.
  • To provide a comprehensive analysis of aberrations for MLA design.

Main Methods:

  • Utilized the differential algebraic (DA) method for aberration calculation.
  • Employed azimuthal Fourier analysis and Fourier-Bessel series expansion to analyze electric fields.
  • Transferred field components into DA arguments for computation.
  • Developed and applied DA theory and algorithms for simultaneous aberration calculation.

Main Results:

  • Successfully calculated primary and high-order aberrations for axial and off-axial microlenses using a single reference ray trace.
  • Analyzed the impact of dodecapole fields on aberrations in example MLAs.
  • Demonstrated the capability of the DA method to handle complex field interactions.

Conclusions:

  • The proposed DA-based approach provides an accurate and efficient method for calculating aberrations in MLAs.
  • Understanding and quantifying high-order aberrations, including those from multipole fields, is vital for advanced electron-beam system design.
  • This work offers a valuable tool for optimizing MLA performance in various applications.