Related Experiment Video
Updated: Jun 4, 2025

Photo-Induced Cross-Linking of Unmodified Proteins PICUP Applied to Amyloidogenic Peptides
Published on: January 12, 2009
Intrinsically photosensitive polyimide photoresist and its double crosslinking mechanism
Peng Yang1, Haiping Yu1, Yuting Zhu1
1Shandong Provincial Key Laboratory of Photoresist, College of Chemistry, Chemical Engineering and Materials Science, Shandong Normal University, Jinan 250014, P. R. China. yangpeng@sdnu.edu.cn.
Abstract:
A new negative-working photoinitiator-free polyimide was developed for photolithographic processes. The polyimide introduced a photosensitive benzophenone unit into the backbone and a cross-linking group (methacrylate) into the side chains. A novel pre-functionalized diamine monomer was designed to avoid using corrosive sulfonyl chloride in the polyimide side-chain introduction step. Mechanistic studies revealed that benzophenone initiates various cross-linking reactions under i-line (UV 365 nm) irradiation, resulting in excellent photolithography performance of polyimide, with a resolution of 10 μm.
Related Concept Videos
Thermal and Photochemical Electrocyclic Reactions: Overview
Photochemical Electrocyclic Reactions: Stereochemistry
Selection Rules: Photochemical Activation
Cycloaddition Reactions: MO Requirements for Photochemical Activation

