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Atomic Force Microscopy

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Demonstration of Equal-Intensity Beam Generation by Dielectric Metasurfaces

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Nanometer Interlaced Displacement Metrology Using Diffractive Pancharatnam-Berry and Detour Phase Metasurfaces.

Nick Feldman^1,2, Kian M M Goeloe¹, Arie J den Boef^2,3,4

¹Department of Information in Matter and Center for Nanophotonics, AMOLF, Science Park 104, 1098 XG Amsterdam, The Netherlands.

|December 23, 2024

Summary

This summary is machine-generated.

This study introduces a new nanoscale displacement sensing platform using diffractive metasurfaces and polarimetric Fourier microscopy. It achieves high-precision measurement of nanometer displacements, crucial for semiconductor manufacturing.

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Area of Science:

Nanotechnology and Metrology
Photonics and Metasurfaces

Background:

Accurate nanoscale structural alignment is critical for semiconductor manufacturing.
Metaphotonics offers methods to convert nanoscale information into measurable signals.

Purpose of the Study:

To propose and demonstrate a novel interlaced displacement sensing platform.
To achieve high-resolution detection of nanometer-scale displacements in device layers.

Main Methods:

Utilized diffractive anisotropic metasurfaces.
Employed polarimetric Fourier microscopy.
Leveraged Pancharatnam-Berry and detour phase shifts for sensing.

Main Results:

Demonstrated a platform capable of resolving few-nanometer displacements.
Showcased transduction of nanoscale displacements into polarization signatures.
Confirmed the platform's ability to resolve arbitrary 2D displacements.

Conclusions:

The developed platform offers a powerful tool for nanoscale metrology.
The sensing mechanism relies on combined phase shifts in metasurfaces.
The platform is suitable for high-speed metrology in device manufacturing.