Kinetically Tailored Chemical Vapor Deposition Approach for Synthesizing High-Quality Large-Area Non-Layered 2D...

Area of Science:

• Materials Science
• Nanotechnology
• Chemical Engineering

Background:

• Non-layered 2D materials possess superior physicochemical properties compared to layered counterparts.
• The isotropic bonding in non-layered materials impedes lateral growth, complicating the synthesis of large-area films.

Purpose of the Study:

• To introduce a facile kinetically tailored chemical vapor deposition (KT-CVD) approach for synthesizing 2D non-layered materials.
• To overcome the challenges in lateral growth and enable large-area film fabrication of 2D molybdenum nitride (MoN).

Main Methods:

• Developed a KT-CVD method by precisely controlling nitrogen vapor pressure.
• Disrupted thermodynamically favored growth kinetics to promote lateral film expansion.
• Synthesized 2D molybdenum nitride (MoN) thin films with dimensions up to 1.5 cm x 1.5 cm.

Main Results:

• Achieved large-scale synthesis of continuous 2D MoN thin films.
• Successfully grew stable crystalline phases of MoN, including delta-MoN (δ-MoN) and gamma-Mo2N (γ-Mo2N).
• Demonstrated excellent surface-enhanced Raman scattering (SERS) and thermal stability for the synthesized δ-MoN.

Conclusions:

• The KT-CVD approach provides an effective strategy for scalable, high-quality synthesis of non-layered 2D materials.
• This advancement expands the fabrication possibilities and applications of devices utilizing non-layered materials.
• The synthesized MoN films show promise for applications requiring SERS and high thermal stability.