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Published on: February 12, 2014
On-machine separation and compensation of target mirror's surface shape errors in multidimensional interferometric
Zuyang Zhang1,2, Qiangxian Huang1,2, Jun Lu1,2
1School of Instrument Science and Opto-Electronic Engineering, Hefei University of Technology, Hefei 230009, China.
This study presents a novel method to separate and compensate for target mirror errors in multi-dimensional interference measurements. The technique significantly improves measurement accuracy by reducing flatness errors from 175 nm to 77 nm.
Area of Science:
- Metrology
- Nanotechnology
- Optical Engineering
Background:
- Interference measurement is crucial for multi-dimensional nanopositioning and nanomeasuring devices.
- Target mirrors are used as spatial reference planes, but their surface errors limit measurement accuracy.
- Existing methods struggle to isolate target mirror errors from workpiece dimensions.
Purpose of the Study:
- To develop a method for on-machine separation and compensation of target mirror surface shape errors.
- To enhance the overall measurement accuracy of multi-dimensional interference systems.
- To provide a reliable compensation model for practical applications.
Main Methods:
- Utilizing a micro-nano-coordinate measuring machine (MNCMM) with interference measurement.
- Employing a home-made resonant probe and a reference flat crystal for error separation.
- Implementing an interpolation algorithm for spatial error compensation based on a derived model.
Main Results:
- Successfully separated and compensated for target mirror surface shape errors.
- Reduced the flatness measurement error of a standard flat crystal from 175 nm to 77 nm.
- Demonstrated the reliability and effectiveness of the proposed on-machine compensation method.
Conclusions:
- The developed method effectively compensates for target mirror surface errors in interference measurement systems.
- This approach significantly enhances the precision of multi-dimensional metrology.
- The technique is broadly applicable to various on-machine compensation scenarios in nanomeasuring devices.
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