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Updated: May 3, 2026

High-speed Continuous-wave Stimulated Brillouin Scattering Spectrometer for Material Analysis
Published on: September 22, 2017
Broadband coherent Fourier scatterometry: A two-pulse approach.
T A van der Sijs1, J Rafighdoost1, L Siaudinyte2
1Optics Research Group, Imaging Physics Department, Delft University of Technology, Van der Waalsweg 8, 2628 CH Delft, The Netherlands.
We developed a broadband coherent Fourier scatterometry (CFS) method using a supercontinuum source. This technique efficiently captures spectral diffraction data for improved dimensional metrology.
Area of Science:
- Optics and Photonics
- Metrology
- Materials Science
Background:
- Coherent Fourier scatterometry (CFS) is a powerful technique for sample characterization.
- Traditional CFS implementations often face limitations in spectral range and cost-effectiveness.
Purpose of the Study:
- To demonstrate a broadband implementation of CFS using a supercontinuum source.
- To enable spectrally resolved diffraction pattern acquisition for enhanced analysis.
- To present a cost-effective approach for multi-wavelength CFS data collection.
Main Methods:
- Utilized a supercontinuum light source for broadband illumination.
- Employed a two-pulse approach with variable time delay, similar to Fourier-transform spectroscopy.
- Captured interferograms in the Fourier plane for each camera pixel.
- Performed per-pixel Fourier transforms as a function of delay to retrieve spectrally resolved diffraction patterns.
Main Results:
- Successfully demonstrated the physical principle of the two-pulse CFS approach.
- Presented experimental realization and results for a silicon line grating.
- Acquired multi-wavelength CFS data over a wide spectral range cost-effectively.
Conclusions:
- The broadband CFS implementation offers a cost-effective method for acquiring extensive spectral diffraction data.
- This technique has the potential to enhance reconstruction robustness and sensitivity in applications like dimensional metrology.
- The presented approach paves the way for more advanced optical metrology applications.
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