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MOSFET: Enhancement Mode
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A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
Published on: April 8, 2018
Taegyu Kwon1, Hyeong Seok Choi1, Dong Hyun Lee1
1Department of Materials Science and Engineering & Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul 08826, Republic of Korea. minhyuk.park@snu.ac.kr.
Hafnium oxide (HfO2)-based ferroelectric memories show promise as artificial synapses. This review explores material properties, challenges, and engineering strategies for enhanced synaptic performance in HfO2 ferroelectric synaptic devices.
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