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Updated: May 31, 2025

Fabrication of Uniform Nanoscale Cavities via Silicon Direct Wafer Bonding

Fabrication of Uniform Nanoscale Cavities via Silicon Direct Wafer Bonding

Published on: January 9, 2014

Nano-Perforated Silicon Membrane with Monolithically Integrated Buried Cavity.

Sanjeev Vishal Kota^1,2, Anil Thilsted², Daniel Trimarco²

¹DTU Nanolab, National Centre for Nano Fabrication and Characterization, Technical University of Denmark, Ørsteds Plads B347, 2800 Kongens Lyngby, Denmark.

|January 25, 2025

Summary

A novel wafer-scale fabrication process creates robust, suspended nano-perforated membranes (NPMs) in silicon. This method enhances mechanical stability and allows for customizable geometries for advanced applications.

Keywords:

CORE DREM buried cavity high aspect ratio monolithic nano-pores perforated membrane silicon nanofabrication

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Last Updated: May 31, 2025

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Published on: January 9, 2014

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Published on: February 23, 2017

Area of Science:

Materials Science
Nanotechnology
Microfabrication

Background:

Existing fabrication methods for nano-perforated membranes (NPMs) face challenges in mechanical robustness and complexity.
There is a need for scalable and adaptable processes to create high-aspect-ratio (HAR) nanoporous structures.

Purpose of the Study:

To develop a wafer-scale process for fabricating monolithically suspended NPMs with integrated support structures in silicon.
To overcome limitations of existing methods regarding mechanical robustness and fabrication complexity.
To enable tunable geometries for diverse applications.

Main Methods:

Utilized a cyclic deposit, remove, etch, and multi-step (DREM) process for directional etching of nano-pores.
Employed a buried cavity formation using an isotropic etch for thick NPMs.
Integrated through-silicon-vias for macro-world connectivity.

Main Results:

Successfully fabricated monolithically suspended NPMs with tunable thicknesses (4.5 µm, 6.5 µm, 12 µm).
Achieved high-aspect-ratio (HAR) nano-pores (300 nm diameter, 700 nm pitch).
Demonstrated a flexible and robust process adaptable to various structural parameters.

Conclusions:

The developed DREM process offers a robust and scalable approach for fabricating advanced NPMs in silicon.
The monolithic design allows for further functionalization and broadens application potential.
NPMs are suitable for demanding applications like purification, separation, and corrosive environments.