Related Experiment Video
Updated: May 24, 2025

14:58
Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping
Published on: June 3, 2015
14.4K
Electronic threshold switching of As-embedded SiO2 selectors: charged oxygen vacancy model
Hye Rim Kim1, Tae Jun Seok1, Tae Jung Ha2
1Department of Materials Science and Chemical Engineering, Hanyang University, Ansan 15588, Republic of Korea.
Nano Convergence
|March 4, 2025
Summary
This study introduces a novel As-SiO2 selector to overcome sneak current issues in non-volatile memory. The research details its operational mechanism, enabling better integration of memory and selector components.
Area of Science:
- Materials Science
- Electrical Engineering
- Semiconductor Device Physics
Background:
- Sneak current in crossbar arrays of non-volatile memories poses a significant challenge.
- Effective alleviation requires coherent integration of threshold switching (TS)-based selectors with memory components.
- Existing integration methods face limitations due to material and operational parameter mismatches.
Purpose of the Study:
- To propose and investigate a highly coherent TS-based selector using an As-embedded SiO2 unit.
- To analyze the structural and electrical characteristics of the As-SiO2 selector.
- To elucidate the TS-on and -off operational mechanism and identify critical control elements.
Main Methods:
- In-depth investigation of the As-SiO2 selector unit's operation process.
- Analysis of structural and electrical characteristics.
- Identification of critical control elements, including electron charging into oxygen vacancies and energy band alignment.
Main Results:
- Detailed characterization of the As-embedded SiO2 selector's structural and electrical properties.
- Presentation of the TS-on and -off operational mechanism.
- Identification of electron charging in oxygen vacancies and band alignment as key control factors.
- Proposal of practical control strategies for TS behavior using a pulse scheme.
Conclusions:
- The proposed As-SiO2 selector offers a highly coherent solution for non-volatile memory applications.
- Understanding electron charging and band alignment is crucial for controlling TS behavior.
- The analytical methodology and operational mechanism advance research in memory/selector integration.
Keywords:
Charged oxygen vacancyCrossbar arrayMechanismPulse schemeSelector deviceThreshold switchingMore Related Videos
Related Concept Videos
MOSFET: Enhancement Mode
259
Enhancement-mode MOSFETs are pivotal components in electronics, distinguished by their capacity to act as highly efficient switches. They are part of the larger family of metal-oxide Semiconductor Field-Effect Transistors (MOSFETs). They are available in two types: p-channel and n-channel, each tailored to specific polarity operations.
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
259
Switching of BJT
353
Switching behavior in Bipolar Junction Transistors (BJTs) is a fundamental aspect utilized in various electronic circuits, particularly for digital logic applications like switches and amplifiers. In a typical switching circuit, a BJT alternates between cut-off and saturation modes, corresponding to the "off" and "on" states, respectively, thus behaving like an ideal switch.
Cut-off Mode ("Off" State): In this state, both the emitter-base and collector-base junctions are...
Cut-off Mode ("Off" State): In this state, both the emitter-base and collector-base junctions are...
353
MOSFET: Depletion Mode
300
Depletion-mode MOSFETs represent a unique subset of MOSFET technology, functioning fundamentally differently from their enhancement-mode counterparts. Unlike enhancement MOSFETs, which require a positive gate-source voltage (Vgs) to turn on, depletion-mode MOSFETs are inherently conductive and "normally on" devices.
The primary characteristic of depletion-mode MOSFETs is their ability to conduct current between the drain and source terminals without gate bias. This inherent conductivity...
The primary characteristic of depletion-mode MOSFETs is their ability to conduct current between the drain and source terminals without gate bias. This inherent conductivity...
300
MOSFET
402
The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) plays a pivotal role in modern electronics thanks to its versatility and efficiency in controlling electrical currents. This device, also known as IGFET, MISFET, and MOSFET, has three main terminals: the Source, Drain, and Gate. MOSFETs are classified into n-channel or p-channel types based on the doping characteristics of their substrate and the source or drain regions.
In an n-MOSFET, the structure includes n-type source and drain...
In an n-MOSFET, the structure includes n-type source and drain...
402
Biasing of Metal-Semiconductor Junctions
188
Biasing metal-semiconductor junctions involves applying a voltage across the junction. Specifically, the metal is connected to a voltage source, while the semiconductor is grounded. This technique is essential for controlling the direction and magnitude of current flow in electronic devices, including diodes, transistors, and photovoltaic cells.
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
188
Biasing of FET
203
Biasing a Junction Field Effect Transistor (JFET) is crucial for setting operational parameters and ensuring efficient functioning in electronic circuits. JFETs are characterized by using a single carrier type in N-channel or P-channel configurations, where the channel is surrounded by PN junctions. These junctions are central to the device's ability to control current flow.
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
203

