Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

Bipolar Junction Transistor01:22

Bipolar Junction Transistor

493
Bipolar Junction Transistors (BJTs) are essential elements in electronic circuits, playing a crucial role in the functionality of amplifiers, memories, and microprocessors. These transistors can be designed as NPN or PNP based on their doping patterns. They consist of three layers: the emitter, base, and collector. The configuration of these layers and their respective doping levels—with N-type or P-type impurities—define the transistor's type and its operational...
493
Modes of Operations of BJT01:21

Modes of Operations of BJT

900
A Bipolar Junction Transistor (BJT) is a versatile component in electronics, functioning in four distinct modes based on the biasing of its junctions: active, saturation, cut-off, and inverted modes.
Active Mode: The most common mode for amplification, the active mode features a forward-biased emitter-base junction and a reverse-biased base-collector junction. This setup enables electrons to be injected from the emitter to the base while blocking the majority carriers at the collector. The...
900
Working Principle of BJT01:15

Working Principle of BJT

351
A Bipolar Junction Transistor (BJT), specifically a PNP transistor in a common-base configuration, effectively amplifies or switches electronic signals by controlling the flow of charge carriers. This discussion focuses on its operation in the active mode.
In the PNP configuration, the emitter is heavily doped with positive charge carriers (holes), while the base is lightly doped with negative carriers (electrons). This setup allows for a forward bias across the emitter-base junction,...
351
Characteristics of MOSFET01:17

Characteristics of MOSFET

316
Metal-oxide-semiconductor field-effect Transistors, or MOSFETs, play a critical role in electronic circuits. They are primarily utilized for amplifying and switching signals.
Various vital parameters influence their functionality, which is crucial for theory and electronics applications. First, channel dimensions, precisely length, and width, are pivotal. The size of these channels affects the transistor's ability to carry current and switching speeds; shorter channels typically enable...
316
Characteristics of BJT01:17

Characteristics of BJT

599
The Bipolar Junction Transistor (BJT), specifically in a common-emitter configuration, exhibits distinct current-voltage characteristics crucial for understanding its behavior in electronic circuits. These characteristics are established through experimental measurements of voltage and current relationships.
For input characteristics, the base-emitter voltage is varied, maintaining a constant collector-emitter voltage. This setup reveals a Shockley-type dependence of the collector current on...
599
MOSFET01:16

MOSFET

402
The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) plays a pivotal role in modern electronics thanks to its versatility and efficiency in controlling electrical currents. This device, also known as IGFET, MISFET, and MOSFET, has three main terminals: the Source, Drain, and Gate. MOSFETs are classified into n-channel or p-channel types based on the doping characteristics of their substrate and the source or drain regions.
In an n-MOSFET, the structure includes n-type source and drain...
402

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Deciphering intrakingdom synergism in 17β-estradiol degradation through DNA-SIP coupled metagenomics: Metabolic cooperation and niche partitioning in bioaugmented soil microbiomes.

Journal of hazardous materials·2025
Same author

Effect of Solder Layer Void Damage on the Temperature of IGBT Modules.

Micromachines·2023
Same author

Reliability Analysis of Flip-Chip Packaging GaN Chip with Nano-Silver Solder BUMP.

Micromachines·2023
Same author

Heat Dissipation Characteristics of IGBT Module Based on Flow-Solid Coupling.

Micromachines·2022
Same author

Development of LED Package Heat Dissipation Research.

Micromachines·2022
Same author

Research on Heat Dissipation of Multi-Chip LED Filament Package.

Micromachines·2022

Related Experiment Video

Updated: May 24, 2025

Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping
14:58

Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping

Published on: June 3, 2015

14.4K

Research Progress on Insulated Gate Bipolar Transistor (IGBT) Modules.

Peisheng Liu1,2, Yaohui Deng2

  • 1Department of Information Technology, Xinglin College Nantong University, Nantong 226236, China.

Micromachines
|March 6, 2025
PubMed
Summary

Insulated gate bipolar transistors (IGBTs) are crucial for modern power electronics. This study explores advancements in IGBT technology for improved performance and efficiency in various applications.

Area of Science:

  • Power Electronics
  • Semiconductor Devices
  • Materials Science

Background:

  • The insulated gate bipolar transistor (IGBT) is a key component in power electronic systems.
  • Rapid advancements in technology necessitate continuous improvement of IGBT performance.

More Related Videos

Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
14:16

Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy

Published on: October 23, 2018

7.6K
Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
10:31

Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors

Published on: November 24, 2016

8.5K

Related Experiment Videos

Last Updated: May 24, 2025

Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping
14:58

Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping

Published on: June 3, 2015

14.4K
Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
14:16

Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy

Published on: October 23, 2018

7.6K
Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
10:31

Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors

Published on: November 24, 2016

8.5K