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Quantifying grating defects in X-ray Talbot-Lau interferometry through a comparative study of two fabrication
Alexandre Pereira1,2, Simon Spindler3,4, Zhitian Shi3,4,5
1Institute for Biomedical Engineering, ETH Zürich and University of Zürich, Zürich, Switzerland. vieirapa@ethz.ch.
Scientific Reports
|April 24, 2025
Summary
High-quality gratings are crucial for X-ray grating interferometry. This study models grating fabrication defects, predicting their impact on Talbot-Lau interferometer performance, with results validated experimentally.
Area of Science:
- Physics
- Materials Science
- Optics
Background:
- X-ray grating interferometry performance relies heavily on grating geometry and quality.
- Fabricating micrometer-pitch, high-aspect-ratio gold gratings for measuring small refraction angles at higher energies presents significant challenges.
Purpose of the Study:
- To investigate the impact of fabrication-induced grating defects on X-ray Talbot-Lau interferometer performance.
- To develop accurate models of grating profiles for simulation-based analysis.
Main Methods:
- Inspection of gold gratings fabricated using gold electroplating in polymeric and silicon templates via conventional microscopy, X-ray synchrotron radiography, and computed laminography.
- Wave-propagation simulations utilizing extracted grating profile features to predict interferometer performance (visibility, absorption).
Main Results:
- Characteristic grating profile features and defects were extracted and modeled.
- Simulations accurately predicted the effects of grating geometry and defects on interferometer performance.
- Simulated outcomes were validated using a table-top Talbot-Lau interferometer setup.
Conclusions:
- Accurate modeling of grating profiles is essential for predicting X-ray interferometer performance.
- The study provides a framework for evaluating grating fabrication techniques and their impact on interferometry.
- This work aids in optimizing grating design and fabrication for advanced X-ray imaging applications.
