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Related Concept Videos

Metallic Solids02:37

Metallic Solids

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Metallic solids such as crystals of copper, aluminum, and iron are formed by metal atoms. The structure of metallic crystals is often described as a uniform distribution of atomic nuclei within a “sea” of delocalized electrons. The atoms within such a metallic solid are held together by a unique force known as metallic bonding that gives rise to many useful and varied bulk properties.
All metallic solids exhibit high thermal and electrical conductivity, metallic luster, and...
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Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition
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Advanced Atomic Layer Modulation Based Highly Homogeneous PtRu Precious Metals Alloy Thin Films.

Yeseul Son1, Sang Bok Kim1, Debananda Mohapatra1

  • 1Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulju-gun, Ulsan, 44919, Republic of Korea.

Advanced Science (Weinheim, Baden-Wurttemberg, Germany)
|May 28, 2025
PubMed
Summary

Atomic Layer Modulation (ALM) precisely controls platinum-ruthenium (PtRu) alloy stoichiometry without complex supercycling. This novel method offers superior electrocatalytic performance and uniform nanoscale films for advanced applications.

Keywords:
PtRu atomic alloyatomic layer depositionatomic layer modulationhomogeneous compositionprecious metals catalysis

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Catalysis

Background:

  • Traditional methods for creating bimetallic alloys like platinum-ruthenium (PtRu) are often complex and lack precise stoichiometric control.
  • Atomic Layer Deposition (ALD) supercycling is a known technique but can be tedious for multielement systems.
  • Controlling alloy composition at the nanoscale is crucial for optimizing material properties, especially in catalysis.

Purpose of the Study:

  • To introduce and demonstrate Atomic Layer Modulation (ALM) as a novel, efficient method for controlling PtRu alloy stoichiometry.
  • To investigate the structural and compositional uniformity of ALM-PtRu films.
  • To evaluate the electrocatalytic performance of ALM-PtRu compared to existing catalysts.

Main Methods:

  • Sequential pulsing of platinum precursor (dimethyl-(N,N-dimethyl-3-butene-1-amine-N)platinum, DDAP) and ruthenium precursor [Ru(TMM)(CO)3] with O2 at 225 °C.
  • Utilizing aberration-corrected ultra-high-resolution scanning transmission electron microscopy, Rutherford backscattered spectrometry, and X-ray diffraction for characterization.
  • Testing step coverage on high aspect ratio 3D trench structures.

Main Results:

  • Achieved precise control over PtRu alloy stoichiometry, with adjustable Pt:Ru ratios from 28:72 to 97:3.
  • Demonstrated homogenized elemental distribution without localized segregation in the nanoscale PtRu films.
  • Exhibited ≈100% step coverage on high aspect ratio structures and uniform film thickness, alongside superior and durable electrocatalytic performance.

Conclusions:

  • Atomic Layer Modulation (ALM) provides a viable and efficient alternative to ALD supercycling for precise PtRu alloy stoichiometry control.
  • ALM-PtRu films exhibit excellent structural uniformity and enhanced electrocatalytic activity, making them promising for catalytic applications.
  • The ALM technique shows potential for extension to other metallic alloy systems, broadening its applicability in materials science.