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Updated: Aug 10, 2026

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
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Review of Directed Self-Assembly Material, Processing, and Application in Advanced Lithography and Patterning

Xiuyan Cheng1, Di Liang1, Miao Jiang1

  • 1Beijing Superstring Academy of Memory Technology, Beijing 100176, China.

Micromachines
|June 27, 2025
PubMed

Keywords:
BCPsDSAadvanced lithography technology

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