Laser Micromachining for the Nucleation Control of Nickel Microtextures for IR Emission

Femtosecond laser micromachining was utilized to build up a micro-through-hole array into a sacrificial film, which was coated onto a copper specimen. This micro-through hole was shaped in the paraboloidal profile, with its micro-dimple on the interface between the copper substrate and the film. This profile was simply in correspondence with the laser energy profile. The array was used as a nucleation and growth site for nickel cluster deposition during wet plating. The micro-pillared unit cells nucleated at the micro-dimple and grew on the inside of the micro-through hole. After removing the sacrificial film, cleansing, and polishing, the nickel micro-pillar array was obtained, standing on the copper substrate. These unit cells and their alignments were measured through scanning electron microscopy and laser microscopy. Thermographic microscopy with FT-IR was utilized to measure the IR emittance as a function of wavelength. The focused areas were varied by controlling the aperture to analyze the effects of arrayed microtextures on the IR emittance.