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Updated: Sep 11, 2025

A Photonic System for Generating Unconditional Polarization-Entangled Photons Based on Multiple Quantum Interference
Published on: September 5, 2019
Type I diffracted photons enable diffraction-free optical lithography, achieving ~14nm resolution for advanced semiconductor patterning. This projection quantum optical lithography (QOL) overcomes traditional limits, paving the way for complex nanoscale designs.
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