Projection version of quantum optical lithography with type I diffracted photons

The suppression of wave-particle duality in multiple-slit experiments indicated the presence of type I diffracted photons with particle behavior. Overcoming the diffraction limit is possible with type I diffracted photons and will be applied in optical lithography. In this paper, we present results on a diffraction-free optical lithography, projection quantum optical lithography (projection QOL), with different NA projection lenses and ∼14nm resolution. A potential application for realizing complex 1 nm patterns is analyzed. Projection QOL could support the research and development efforts of the semiconductor chip industry.