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Updated: May 27, 2025

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
Field-effect transistors based on nickel oxide doped with nitrogen semiconductor ferroelectrics for ultralow voltage
S Vulpe1, M Dragoman1, M Aldrigo1
1National Institute for Research and Development in Microtechnologies (IMT), Str. Erou Iancu Nicolae 126A, Voluntari (Ilfov), Romania.
Abstract:
A single field-effect transistor (FET) based on nitrogen doped-nickel oxide (NiON) semiconductor ferroelectric shows an ultralow voltage switch at a gate voltage value of just 1μV and a subthreshold swing (SS) of 55 mV/decade. The same FET acts as a ferroelectric capacitive non-volatile memory between the drain and the ground. All these features are retrieved in a FET based on NiON grown on a thin layer of aluminum oxide (Al2O3), which was deposited on a doped silicon (Si) wafer. After 1 year, we retrieved the same values in our devices without any thermal annealing or other procedures to wake up the ferroelectricity.
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