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Optimization strategies for suppressing instrumentation drift effects in measurements
Optics Express
|August 13, 2025
Summary
Environmental drift impacts measurement accuracy. A new optimized scanning method transforms low-frequency drift into high-frequency components, significantly improving accuracy and efficiency in surface profiler measurements.
Area of Science:
- Metrology
- Optical Engineering
- Instrumentation
Background:
- Environmental factors like temperature fluctuations cause drift, degrading measurement accuracy in precision instruments.
- Traditional methods for drift suppression in surface profilers, such as forward-backward scanning, are inefficient and ineffective against nonlinear drift.
Purpose of the Study:
- To develop a novel measurement strategy for suppressing low-frequency environmental drift in long-range surface profiler measurements.
- To improve measurement efficiency and accuracy by transforming drift characteristics rather than relying on averaging.
Main Methods:
- A new approach inspired by lock-in amplifiers (LIA) to shift drift frequencies into a filterable range.
- Implementation of optimized forward-backward downsampled path scanning and random sampling strategies.
- Multi-objective optimization to determine optimal sampling parameters for balancing accuracy and efficiency in long-trace profiler (LTP) systems.
Main Results:
- Simulations demonstrated that optimized path scanning effectively suppresses both linear and nonlinear drift, outperforming traditional and random methods.
- Experimental validation showed an 18 nrad RMS drift error and a 48.4% reduction in measurement time compared to conventional scanning.
- The proposed method significantly enhances system robustness by reducing reliance on stringent environmental controls.
Conclusions:
- Optimized downsampled path scanning offers a robust and efficient solution for high-precision optical surface metrology.
- This technique alleviates the need for extensive environmental stabilization, enabling direct measurements.
- The findings present a new paradigm for drift suppression in sensitive metrology applications.
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