Research on Optimized Design of In Situ Dynamic Variable-Aperture Device for Variable-Spot Ion Beam Figuring

Ion beam figuring (IBF) is an ultra-high-precision surface finishing technology characterized by a distinct trade-off between the spot size of the removal function and its corresponding figuring capabilities. A larger spot size for the removal function leads to higher processing efficiency but lower figuring ability. Conversely, a smaller spot size results in higher figuring ability but lower efficiency. Adjusting the spot size of the removal function using tools with an aperture is a possible approach. However, existing variable-aperture tools have certain limitations in IBF processing. To leverage the advantages of both large and small spot sizes for the removal function during IBF processing, an in situ dynamic beam variable-aperture device has been designed. This device optimizes the parameters of diaphragm sheets and employs FOC for dynamic aperture adjustment. Simulations show that 12 numbers of 0.1 mm-thick sheets minimize removal function distortion, with the thermal strain-induced area variation being <5%. FOC enables rapid (≤0.45 s full range) and precise aperture control. Experiments confirm adjustable spot sizes (FWHM 0.7-17.2 mm) with Gaussian distribution (correlation >96.7%), operational parameter stability (relative change rate ≤5%), and high repeatable positioning precision (relative change rate ≤3.2% in repeated adjustments). The design enhances IBF efficiency, flexibility, and accuracy by enabling in situ spot size optimization, overcoming conventional limitations.