Robust dehydrofluorination of HFC-245fa to HFO-1234ze via in situ VOFx formation over a non-oxalic acid assisted

Fizzah Fatima1, Mudadla Umamaheswara Rao1, Guo-Ping Chang-Chien2,3,4

  • 1Department of Chemistry, Indian Institute of Technology Hyderabad, Kandi, 502285, Telangana, India. csubbu@iith.ac.in.

Nanoscale Horizons
|September 5, 2025
PubMed

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