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Integrated Seamless Non-Noble Plasmonic Ni-Upconversion Nanofilm for Stable and Enhanced Fluorescence Performance.

Hao Zeng1,2,3, Longhui Han1,2,3, Yang Li1,2,3

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Summary

This study developed a novel nickel-upconversion (Ni-UC) nanofilm for optoelectronics. The integrated Ni-UC nanofilm significantly enhances fluorescence intensity and offers improved stability and processing compatibility.

Keywords:
NaYF4nanofabricationnanofilmsurface plasmon resonanceupconversion

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Area of Science:

  • Materials Science
  • Optoelectronics
  • Nanotechnology

Background:

  • Upconversion (UC) nanofilms are crucial for optoelectronics but face challenges in thickness control and fluorescence intensity.
  • Lanthanide-doped materials are often powders, hindering device integration, while physical vapor deposition (PVD) yields poor crystalline structures and weak fluorescence.
  • Integrating non-noble plasmonic materials like nickel (Ni) with UC layers is a promising strategy to enhance fluorescence via surface plasmon resonance.

Purpose of the Study:

  • To develop an integrated Ni-UC nanofilm with enhanced fluorescence intensity and improved structural properties.
  • To investigate the effect of post-annealing on the crystalline structure and optical properties of the Ni-UC nanofilm.
  • To evaluate the potential of this novel material for advanced optoelectronic and sensing applications.

Main Methods:

  • Fabrication of an ultrathin Ni layer and a NaYF4:Tm, Yb UC layer using PVD.
  • Post-annealing treatment at 500 °C to optimize the crystalline structure and protect the Ni layer.
  • Characterization of fluorescence intensity, crystalline phase, transparency, and stability of the fabricated nanofilms.

Main Results:

  • Post-annealing transformed the UC layer into a hexagonal-phase crystal structure and prevented Ni oxidation.
  • The annealed UC nanofilm showed fluorescence peaks at 476, 648, and 699 nm.
  • The integrated Ni-UC nanofilm exhibited significantly enhanced fluorescence intensities (up to 5.29 times higher) compared to the annealed UC nanofilm alone.
  • The Ni-UC nanofilm demonstrated high transparency, stability, and protective benefits for the Ni layer.

Conclusions:

  • The integrated Ni-UC nanofilm design overcomes limitations of traditional UC materials and PVD methods.
  • Post-annealing is critical for achieving optimal crystalline structure and fluorescence enhancement.
  • This cost-effective, non-noble plasmonic system shows great potential for advanced optoelectronics and sensing technologies.