Related Experiment Video
Updated: Jan 13, 2026

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
Large-scale crossbar arrays based on three-terminal MoS2 memtransistors
Thomas F Schranghamer1, Andrew Pannone1, Jishnu M Kumar1
1Engineering Science and Mechanics, Penn State University, University Park, PA, USA.
Abstract:
Memristive crossbar architectures are promising as efficient, low-power inference engines for edge AI applications. However, inputs with minor differences often yield similar outputs, requiring additional processing methods such as confidence scoring, feedback mechanisms, crossbar redundancy, or hybrid analog-digital approaches to resolve. These methods can be impractical for resource-limited edge devices. In contrast, three-terminal memtransistors can dynamically tune conductance via gate control, effectively resolving similar outputs and enhancing separability without retraining. Here, we present dense, large-scale crossbar array architectures incorporating up to 2048 MoS2 memtransistors per array, achieving >92% yield across multiple arrays while individual memtransistors exhibit write energies as low as ~0.2 fJ, maintain read margins up to 10⁵, and offer a projected retention exceeding three years. These architectures demonstrate the ability to resolve inference ambiguities through gate modulation without the need for costly retraining or reprogramming. We also validate their performance by successfully classifying handwritten digits from the MNIST database. Finally, we benchmark the performance of MoS2 memtransistors against other 2D material-based architectures and project their potential compared to state-of-the-art AI accelerators. We believe that this work furthers the ongoing development of in-memory processors for decentralized edge applications and that future studies aimed at reducing device-to-device variation and improving long-term non-volatile memory would only enhance inference capabilities.
Related Concept Videos
MOS Capacitor
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
MOSFET
In an n-MOSFET, the structure includes n-type source and drain...
Characteristics of MOSFET
Various vital parameters influence their functionality, which is crucial for theory and electronics applications. First, channel dimensions, precisely length, and width, are pivotal. The size of these channels affects the transistor's ability to carry current and switching speeds; shorter channels typically enable...
MOSFET: Enhancement Mode
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
MOSFET Amplifiers
Metal-Semiconductor Junctions
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...

