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[(Ph3P)Ag(OCF2CF2SO2F)]2: A Thermally Stable Reagent for Fluorosulfonyl Tetrafluoroethoxylation
Shunli Chen1, Long Lu1, Qilong Shen1
1State Key Laboratory of Fluorine and Nitrogen Chemistry and Advanced Materials, Shanghai Institute of Organic Chemistry, University of Chinese Academy of Sciences, Chinese Academy of Sciences, 345 Lingling Road, Shanghai 200032, P. R. China.
None:
A thermally stable, light-insensitive crystalline fluorosulfonyl tetrafluoroethoxylating reagent, [(Ph3P)Ag(OCF2CF2SO2F)]2 (1), was developed. The reagent demonstrates high nucleophilicity toward diverse electrophiles, including benzyl bromides/chlorides, alkyl bromides, triflates, and secondary alkyl nosylates. The incorporated sulfonyl fluoride moiety demonstrates remarkable versatility, undergoing facile conversion to both sulfonates and sulfones through reactions with various nucleophiles. Furthermore, we have successfully applied this chemistry to prepare a series of photoacid generators with potential applications in photolithography technology.
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