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Updated: Jan 10, 2026

Fabrication of Spatially Confined Complex Oxides
Published on: July 1, 2013
Designing atomic-scale resistive circuits in topological insulators through vacancy-induced localized modes
Cunyuan Jiang1,2, Weicen Dong1,2, Matteo Baggioli1,2
1School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, People's Republic of China.
Abstract:
The interplay between structural defects and topological properties gives rise to a diverse range of intriguing physical phenomena. Here, we revisit the idea that vacancies can induce topologically protected localized electronic excitations within the bulk of a topological insulator, and when sufficiently close, give rise to one-dimensional propagating chiral bulk modes. We show that the dynamics of these modes can be effectively described by a tight-binding Hamiltonian, with the hopping parameter determined by the overlap of electronic wave functions between adjacent vacancies, accurately predicting the low-energy spectrum. Building on this phenomenon, we propose that vacancies in topological materials can be utilized to design atomic-scale resistive circuits, and estimate the associated resistance as a function of the vacancy distribution's geometric properties.
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