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Temperature-Dependent Reverse-Recovery Behavior Analysis and Circuit-Level Mitigation of Superjunction MOSFETs
Wenrong Cui1, Peng Liao1, Yanghao Wang1
1State Key Laboratory of Integrated Chips and Systems, School of Microelectronics, Fudan University, Shanghai 200433, China.
None:
This study explores the temperature dependence of reverse-recovery behavior in superjunction metal-oxide-semiconductor field-effect-transistors (MOSFETs) using experiments and Technology Computer-Aided Design (TCAD) simulations. Results show that at 145 °C, switching failure occurs due to severe reverse-recovery degradation. The main cause is the temperature-induced increase in carrier lifetime, leading to a higher reverse-recovery charge, current, and time. A practical solution is proposed by adding a small parallel capacitor, which effectively suppresses reverse recovery and improves switching reliability. This work provides physical insight and a simple strategy for optimizing superjunction MOSFET performance in high-temperature power electronics.
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