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Updated: Jan 10, 2026

Fabrication of Magnetic Nanostructures on Silicon Nitride Membranes for Magnetic Vortex Studies Using Transmission Microscopy Techniques

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Fabrication Process Development for Optical Channel Waveguides in Sputtered Aluminum Nitride.

Soheila Mardani¹, Bjorn Jongebloed^1,2, Ward A P M Hendriks²

¹Integrated Optical Systems (IOS) Group, MESA+ Institute for Nanotechnology, University of Twente, 7500AE Enschede, The Netherlands.

|November 27, 2025

Summary

This summary is machine-generated.

Aluminum nitride (AlN) thin films were fabricated for integrated photonics. Optimized processing achieved low propagation losses in AlN optical waveguides, demonstrating potential for advanced photonic devices.

Keywords:

aluminum nitride (AlN) thin films integrated photonics optical waveguides

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Published on: June 25, 2020

Area of Science:

Materials Science
Optoelectronics
Semiconductor Physics

Background:

Aluminum nitride (AlN) is a wide-bandgap semiconductor with UV-Vis-MIR transparency.
Its properties make it suitable for integrated photonics applications.
Challenges exist in processing AlN due to oxidation sensitivity.

Purpose of the Study:

To develop a microfabrication process for AlN optical channel waveguides.
To reduce propagation losses in AlN slab waveguides through annealing.
To characterize the performance of AlN waveguides using microring resonators.

Main Methods:

Reactive RF sputtering for AlN thin film deposition.
Annealing at 600 °C in a nitrogen atmosphere.
Prism coupling and microring resonator (MRR) fabrication for loss characterization.

Main Results:

Reduced slab waveguide propagation loss to 0.84 dB/cm at 978 nm after annealing.
Fabricated MRRs achieved a quality factor of 12,000.
Channel waveguides exhibited a propagation loss of 4.4 dB/cm at 1510-1515 nm.

Conclusions:

The developed microfabrication process enables AlN optical channel waveguide realization.
Identified dominant loss mechanisms and proposed optimization strategies.
AlN is a viable material for integrated photonic circuits with further process refinement.