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Updated: Jun 17, 2026

Fabrication of Silica Ultra High Quality Factor Microresonators
Published on: July 2, 2012
Luca Sacchi1,2, Alfonso Palmieri1, Vitthal Mishra3,4
1Harvard John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02134, United States.
Low-index metasurfaces, using silica (SiO2), outperform high-index materials like titania (TiO2) by suppressing unwanted modes. This enables efficient, broadband, and error-resilient flat optics fabrication.
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