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TiN Plasmonic Metamaterial Arrays Fabricated at Low Temperatures on Versatile Substrates
Ryan Bower1, Daniel A L Loch2, Ethan Muir2
1Department of Materials, Royal School of Mines, Imperial College London, Exhibition Road, South Kensington, London SW7 2AZ, U.K.
ACS Applied Optical Materials
|January 1, 2026
Summary
Transition metal nitrides (TMNs) offer plasmonic potential but require high temperatures. This study demonstrates room-temperature deposition of plasmonic titanium nitride (TiN) thin films using high-power impulse magnetron sputtering (HIPIMS).
Area of Science:
- Materials Science
- Nanotechnology
- Optoelectronics
Background:
- Transition metal nitrides (TMNs) are explored for plasmonic and optoelectronic applications.
- Conventional deposition of plasmonic TMNs necessitates high temperatures exceeding 800 °C.
- This limits their use on temperature-sensitive substrates like polymers.
Purpose of the Study:
- To develop a low-temperature deposition method for plasmonic titanium nitride (TiN) thin films.
- To enable the fabrication of TiN-based plasmonic nanostructures on diverse substrates.
- To investigate the plasmonic properties of room-temperature deposited TiN.
Main Methods:
- High-power impulse magnetron sputtering (HIPIMS) was employed for TiN deposition at room temperature.
- Colloidal lithography was used to create tunable TiN nanoarrays (100-500 nm).
- Optical response and plasmonic performance were characterized and compared with simulations.
Main Results:
- High-quality TiN thin films were successfully deposited at room temperature without intentional heating.
- Plasmonic TiN nanoarrays with tunable shapes and dimensions were fabricated on various substrates, including flexible polymers.
- Tailorable plasmonic resonances in the visible and near-infrared (NIR) spectral regions were achieved.
Conclusions:
- HIPIMS enables low-temperature deposition of plasmonic TiN, overcoming previous temperature limitations.
- This method facilitates the integration of plasmonic TiN onto flexible substrates for advanced applications.
- The developed technique allows for precise control over plasmonic properties through nanoarray design.
