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All-nitride superconducting qubits based on atomic layer deposition.

Danqing Wang1, Yufeng Wu1, Naomi Pieczulewski2

  • 1Department of Electrical and Computer Engineering, Yale University, New Haven, CT, USA.

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This summary is machine-generated.

Superconducting qubits fabricated using atomic layer deposition (ALD) demonstrate Josephson tunneling through tunable barriers. These all-nitride qubits show microsecond relaxation times, enabling scalable quantum processors.

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Area of Science:

  • Quantum Computing
  • Materials Science
  • Thin-Film Deposition

Background:

  • Scalable quantum processors require superconducting qubits operable at higher temperatures.
  • Atomic layer deposition (ALD) offers precise control for thin-film growth, crucial for fabricating complex quantum circuits.

Purpose of the Study:

  • To develop superconducting qubits using ALD for enhanced scalability and high-temperature operation.
  • To investigate the tunability and uniformity of Josephson tunneling in ALD-fabricated NbN/AlN/NbN trilayers.

Main Methods:

  • Fabrication of NbN/AlN/NbN trilayer superconducting qubits entirely via ALD.
  • Systematic variation of AlN barrier thickness by adjusting ALD cycles.
  • Characterization of Josephson tunneling properties and qubit performance.

Main Results:

  • Achieved Josephson tunneling through AlN barriers with critical current density spanning seven orders of magnitude.
  • Demonstrated uniformity and versatility of the ALD process for qubit fabrication.
  • Observed microsecond-scale relaxation times in transmon qubits at temperatures above 300 mK due to high Tc NbN.

Conclusions:

  • ALD is a viable low-temperature deposition technique for superconducting quantum circuits.
  • All-nitride ALD qubits present a promising platform for high-temperature quantum computing applications.
  • ALD enables precise control over qubit parameters for scalable quantum processor development.