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Zero-method scanning-probe profilometer for steeply curved aspheric x-ray mirrors
Hirokatsu Yumoto1,2, Takahisa Koyama1,2, Haruhiko Ohashi1,2
1Japan Synchrotron Radiation Research Institute, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan.
The Review of Scientific Instruments
|January 27, 2026
Summary
A new non-contact scanning profilometer, the Zero-method Scanning-probe Profilometer (ZSP), achieves 1.3 nm reproducibility for precise x-ray optics metrology. This advancement is crucial for developing next-generation synchrotron radiation and x-ray free-electron laser facilities.
Area of Science:
- Optics and Metrology
- Advanced Materials Science
- Particle Accelerators
Background:
- High-intensity, coherent X-ray sources like X-ray Free-Electron Lasers (XFELs) and synchrotrons demand ultra-precise optics.
- Current surface figure metrology struggles with the steep and aspheric profiles of next-generation X-ray optics.
- Sub-nanometer figure accuracy is essential for preserving wavefront quality and beam intensity.
Purpose of the Study:
- Introduce a novel non-contact scanning profilometer for high-accuracy X-ray optic metrology.
- Overcome limitations of conventional stitching interferometry, particularly cumulative errors.
- Enable precise measurement of complex aspheric surfaces for advanced X-ray applications.
Main Methods:
- Developed the Zero-method Scanning-probe Profilometer (ZSP), integrating a chromatic confocal sensor.
- Employed a "zero method" measurement technique to eliminate sensor linearity errors.
- Tested the ZSP on a steeply curved elliptical-cylindrical mirror with significant sag and grazing-incident angles.
Main Results:
- Achieved a root-mean-square reproducibility of 1.3 nm on a challenging elliptical-cylindrical mirror.
- Successfully validated the ZSP's performance in fabricating an X-ray nanofocusing mirror.
- Demonstrated the ZSP's capability for measuring complex two-dimensional aspheric surfaces.
Conclusions:
- The ZSP offers a significant advancement in ultra-precision metrology for X-ray optics.
- The developed technique overcomes key challenges in measuring advanced optical components.
- This method supports the development of future high-performance X-ray analytical techniques and facilities.
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