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Suppressing mask 3D effects in plasmonic lithography via a single high-k wavevector interference.
Optics Express
|March 18, 2026
Summary
Plasmonic lithography (PL) can achieve sub-diffraction imaging. A novel single high spatial frequency imaging mode significantly enhances pattern fidelity by suppressing mask 3D effects, unlike multi-spatial frequency methods.
Area of Science:
- Optics
- Nanotechnology
- Materials Science
Background:
- Plasmonic lithography (PL) utilizes surface plasmon polaritons (SPPs) for sub-diffraction imaging.
- Conventional PL structures face challenges with mask 3D (M3D) effects, degrading pattern fidelity.
- Imaging mode in multilayer PL systems is sensitive to material properties.
Purpose of the Study:
- To investigate an alternative imaging mode in PL for enhanced imaging quality.
- To suppress mask 3D (M3D) effects in advanced lithography nodes.
- To compare the performance of different imaging modes against M3D effects.
Main Methods:
- Demonstration of a novel PL imaging mode leveraging spatial frequency filtering.
- Numerical simulations to compare imaging metrics (FWHM, contrast, NILS) under M3D effects.
- Quantitative analysis of multi-spatial frequency vs. single high spatial frequency imaging.
Main Results:
- Single high spatial frequency imaging significantly suppresses M3D effects.
- Multi-spatial frequency collaborative imaging shows high sensitivity to M3D effects.
- The proposed mode enhances imaging quality and pattern fidelity.
Conclusions:
- Single high spatial frequency imaging offers a promising pathway for high-fidelity nanoscale patterning.
- This approach mitigates M3D effects critical for advanced lithography nodes.
- The findings contribute to overcoming limitations in current PL systems.
