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Suppressing mask 3D effects in plasmonic lithography via a single high-k wavevector interference.

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    Plasmonic lithography (PL) can achieve sub-diffraction imaging. A novel single high spatial frequency imaging mode significantly enhances pattern fidelity by suppressing mask 3D effects, unlike multi-spatial frequency methods.

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    Area of Science:

    • Optics
    • Nanotechnology
    • Materials Science

    Background:

    • Plasmonic lithography (PL) utilizes surface plasmon polaritons (SPPs) for sub-diffraction imaging.
    • Conventional PL structures face challenges with mask 3D (M3D) effects, degrading pattern fidelity.
    • Imaging mode in multilayer PL systems is sensitive to material properties.

    Purpose of the Study:

    • To investigate an alternative imaging mode in PL for enhanced imaging quality.
    • To suppress mask 3D (M3D) effects in advanced lithography nodes.
    • To compare the performance of different imaging modes against M3D effects.

    Main Methods:

    • Demonstration of a novel PL imaging mode leveraging spatial frequency filtering.
    • Numerical simulations to compare imaging metrics (FWHM, contrast, NILS) under M3D effects.
    • Quantitative analysis of multi-spatial frequency vs. single high spatial frequency imaging.

    Main Results:

    • Single high spatial frequency imaging significantly suppresses M3D effects.
    • Multi-spatial frequency collaborative imaging shows high sensitivity to M3D effects.
    • The proposed mode enhances imaging quality and pattern fidelity.

    Conclusions:

    • Single high spatial frequency imaging offers a promising pathway for high-fidelity nanoscale patterning.
    • This approach mitigates M3D effects critical for advanced lithography nodes.
    • The findings contribute to overcoming limitations in current PL systems.