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Real-Time DC-dynamic Biasing Method for Switching Time Improvement in Severely Underdamped Fringing-field Electrostatic MEMS Actuators

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Research on Multi-Frequency Vibration Dynamic Compensation Scheme for Electron Beam Inspection Equipment.

Junhai Jiang¹, David Wei Zhang¹, Ziyu Liu¹

¹School of Microelectronics, Fudan University, Shanghai 200433, China.

|March 28, 2026

Summary

This summary is machine-generated.

This study introduces a novel vibration compensation system for electron beam inspection equipment. The system significantly reduces multi-frequency vibrations, enhancing precision and speed for advanced integrated circuit manufacturing.

Keywords:

dynamic compensation electron beam inspection positioning information production line application single and multi-frequency vibration

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Area of Science:

Semiconductor Manufacturing
Metrology and Inspection
Vibration Control

Background:

Vibration is a critical challenge in electron beam inspection equipment, impacting precision and speed in advanced integrated circuit manufacturing.
Existing vibration compensation methods often fail to meet industrial-grade precision and real-time requirements, especially for multi-frequency vibrations.

Purpose of the Study:

To design and implement a high-speed electron beam vibration compensation system based on positioning.
To improve the performance of vibration compensation for electron beam inspection equipment in industrial settings.

Main Methods:

Development of a system integrating laser positioning and electrostatic scanning deflectors.
Optimization of positioning processing, control algorithms, and calibration software.
Implementation of an integrated signal processing and compensation signal output module.

Main Results:

Effective compensation for single and multi-frequency disturbances below 200 Hz.
Achieved an average vibration attenuation of 50% to 90%.
Demonstrated a repetitive compensation accuracy of less than 0.3 nm, meeting industrial requirements.

Conclusions:

The proposed system meets industrial application requirements for electron beam inspection equipment.
Long-term repeatability tests confirm the system's stability for industrial production lines.
The system offers practical applicability for enhancing yield assurance in semiconductor manufacturing.