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Updated: Apr 23, 2026

Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography

Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography

Published on: September 2, 2017

Gold nanoparticle arrays using pre-patterned silicon substrates.

Gabriele Schmidl¹, Marco Diegel², Weixuan Li²

¹Leibniz Institute of Photonic Technology (Leibniz-IPHT), Albert-Einstein- Str. 9, 07745, Jena, Germany. gabriele.schmidl@leibniz-ipht.de.

|April 22, 2026

Summary

This summary is machine-generated.

Researchers developed a method for creating ordered gold nanoparticle arrays on patterned silicon substrates. This technique optimizes nanoparticle formation for enhanced plasmonic properties.

Keywords:

Crystallite and particle sizes Electron microscopy Gold nanoparticle array Pre-patterned silicon substrates Thermal dewetting X-ray diffraction

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Last Updated: Apr 23, 2026

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Area of Science:

Materials Science
Nanotechnology
Surface Science

Background:

Controlling nanoparticle arrangement is crucial for advanced optical and electronic applications.
Dewetting of thin gold films on silicon is a common method for nanoparticle synthesis.

Purpose of the Study:

To demonstrate a method for producing well-ordered gold nanoparticle arrays.
To investigate the influence of substrate patterning and annealing conditions on gold nanoparticle formation.

Main Methods:

Investigated gold particle formation on flat and pre-patterned silicon substrates.
Annealed gold layers of varying thicknesses (10-40 nm) at different temperatures (800°C and 1100°C).
Characterized nanoparticle arrays using X-ray diffraction and optical absorbance spectroscopy.

Main Results:

A 20 nm gold layer on a square-patterned silicon substrate annealed at 1100°C yielded well-defined nanoparticle arrays.
Particle formation and ordering were significantly improved by using pre-patterned substrates compared to flat ones.
Optical absorbance spectroscopy confirmed the plasmonic properties of the synthesized nanoparticles.

Conclusions:

Pre-patterned silicon substrates enable the controlled production of ordered gold nanoparticle arrays.
Optimized annealing and gold layer thickness are critical for achieving desired nanoparticle morphology and properties.
This method offers a pathway for fabricating nanostructures with tailored plasmonic responses.