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Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films
Published on: December 4, 2014
Topochemical Fluorination Yields Long-Range Superlattice in Epitaxial La2NiO4 Thin Films
Ari B Turkiewicz1, Abigail Y Jiang2, Suk Hyun Sung3,4
1Department of Physics, Harvard University, Cambridge, Massachusetts 02138, United States.
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Layered nickelates host a variety of correlated electronic phenomena that can be tuned through doping, strain, and dimensionality. Here, we explore anion engineering as an alternative tuning knob to modify the properties of layered nickelate thin films. First, we synthesize epitaxial thin films of the n = 1 Ruddlesden-Popper nickelate, La2NiO4. We then achieve transformation to crystalline La2NiO3F2 thin films through redox-neutral, topochemical fluorination. X-ray diffraction and electron microscopy confirm the atomic structure and crystallinity of La2NiO4 and La2NiO3F2. X-ray absorption spectroscopy further confirms a NiO4F2 coordination environment and Ni2+ oxidation state following fluorination, while electronic transport measurements reveal semiconducting behavior across a range of compressive strain states (ϵ = -1.9% to -5.8%). High dynamic range reciprocal space mapping reveals nanoscale periodicity that emerges upon fluorination, and computational analysis indicates that La2NiO3F2 is susceptible to transverse structural distortions. Overall, we illustrate topochemical fluorination and anion engineering as a tuning knob to modify the chemical and electronic properties of complex oxide thin films.

