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Surface-Selective Nucleation of Polymeric Resists for Bottom-Up Nanofabrication
Chun Li1,2, Jiaxun Yao1, Yinglin Zhi1
1Department of Materials Science and Engineering, Southern University of Science and Technology, Shenzhen, China.
Advanced Materials (Deerfield Beach, Fla.)
|June 29, 2026
Summary
Researchers developed a new surface-selective nucleation (SSN) method for nanoscale resist patterning. This technique enables cost-effective, high-resolution 3D micro/nanofabrication with improved processability and broad applicability.
Area of Science:
- Materials Science
- Nanotechnology
- Chemical Engineering
Background:
- Current bottom-up micro/nanofabrication methods lack resist patterning with photoresist-level reproducibility and universality.
- Photolithography faces limitations in multilayer, 3D, and cost-effective manufacturing.
Purpose of the Study:
- To explore a surface-selective nucleation (SSN) effect for deriving polymeric resist patterns.
- To achieve nanoscale resolution, 3D compatibility, low defect density, and clean lift-off in resist patterning.
- To develop a universally applicable resist patterning technology for micro/nanofabrication.
Main Methods:
- Utilized solution-phase polymerization of dual-ended acrylic monomers on prepatterned substrates.
- Engineered surface-mediated nucleation barriers using adsorption inhibitors and chain terminators.
- Modulated surface and bulk free energy of nucleation to control polymerization.
Main Results:
- Achieved nanoscale resolution patterning with inherent 3D compatibility and low defect density.
- Demonstrated tunable resist thickness (13-150 nm) and minimal surface roughness (0.91 nm).
- Delivered 15 nm linewidth patterning with 99.97% coverage across wafer-scale arrays in 10 seconds.
Conclusions:
- The SSN effect provides a robust method for polymeric resist patterning with high reproducibility and processability.
- This technique is highly compatible with mainstream thin-film deposition techniques like e-beam evaporation, sputtering, and atomic layer deposition.
- The developed SSN method offers a cost-effective and versatile solution for advanced micro/nanofabrication platforms.
