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Updated: Jul 4, 2026

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
Programmable Hydrogen-Assisted Chemical Vapor Deposition Growth and Bipolar Transport in Two-Dimensional MoO2
Yang Ma1, Nasrullah Wazir1, Lintao Li1
1National Laboratory of Solid-State Microstructures, College of Engineering and Applied Sciences, Jiangsu Key Laboratory of Artificial Functional Materials, and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210023, China.
Abstract:
Two-dimensional (2D) MoO2 nanoflakes offer metallic conductivity and multiband structure, but their controlled growth remains limited by coupled precursor transport and reduction chemistry. Here we establish a programmable chemical vapor deposition approach with precisely timed H2 introduction, decoupling precursor transport from surface reduction. This temporal gating yields thickness-controlled (5-30 nm), highly crystalline single-crystal MoO2 nanoflakes. Time-resolved optical microscopy, X-ray diffraction, and Raman spectroscopy reveal a stepwise MoO3 to MoO2 pathway involving Mo4O11-like intermediates. Adjusting the H2/Ar ratio controls nucleation density, lateral size, and thickness. The same timing principle also guides the 2D growth of WO2 and Cr2O3. Temperature-dependent Hall measurements show nonlinear Hall behavior and, in thinner flakes, sign reversal of the Hall coefficient, providing direct evidence for bipolar transport with thickness-dependent electron-hole balance. This temporal gating approach provides a general strategy for nonlayered oxide growth and advances understanding of multicarrier transport in MoO2.
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